Effects of aluminum incorporation on band alignment at the SiO2/HfO2 interface
Journal
PHYSICAL REVIEW B
Vol
77
Page
p.1-7
Author
O. Sharia, G. Bersuker, B. H. Lee and A. Demkov
Year
2008
Date
2008.02.28
doi
http://doi.org/10.1103/PhysRevB.77.085326
File
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