Effects of In Situ O2 Plasma Treatment on OFF-State Leakage and Reliability in Metal-Gate/High-k Dielectric MOSFETs
- Journal
- IEEE Electron Device Letters
- Vol
- 29 (6)
- Page
- p.565-567
- Year
- 2008
- File
- 2008_EDL_KTLEE1.pdf (408.6K) 0회 다운로드 DATE : 2021-04-01 14:55:34
- Link
- http://doi.org/10.1109/LED.2008.922992 97회 연결