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Effects of interfacial layer growth on the electrical characteristics of thin titanium oxide films on silicon

Journal

Applied Physics Letters

Vol

74

Page

3143

Author

B. H. Lee, Y. Jeon, K. Zawadzki, W. Qi and J. C. Lee

Year

1999

Date

1999.05.24

doi

https://doi.org/10.1063/1.124089

File

1999_APL_B.H.Lee.pdf (299.4K) 0회 다운로드 DATE : 2021-04-01 15:02:29

Link

https://doi.org/10.1063/1.124089 114회 연결