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    • Ultrathin zirconium silicate film with good thermal stability for alternative gate dielectric application
    Journal
    Applied Physics Letters
    Vol
    77 (11)
    Page
    1704
    Author
    W. Qi, R. Nieh, E. Dhamarajan, B. H. Lee, Y. Jeon, L. Kang, K. Onishi, and J. C. Lee
    Year
    2000
    Date
    2000.09.05
    doi
    https://doi.org/10.1063/1.1308535
    File
    2000_APL_W.Qi.pdf (516.8K) 0회 다운로드 DATE : 2021-04-01 15:18:15