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Spectroscopic ellipsometry characterization of high-k dielectric HfO2 thin films and the high-temperature annealing effects on their optical properties

Journal

Applied Physics Letters

Vol

80

Page

1249

Author

Y.J. Cho, N.V.Nguyen, C.A.Richter, J.R.Ehrstein, B. H. Lee, and Jack C.Lee

Year

2002

Date

2002.02.14

doi

https://doi.org/10.1063/1.1448384

File

2002_APL_Y.J.Cho.pdf (293.3K) 0회 다운로드 DATE : 2021-04-01 15:39:10

Link

https://doi.org/10.1063/1.1448384 140회 연결