포항공대 EESL Fearless challenge

Evaluation of NBTI in HfO2 Gate Dielectric Stacks With Tungsten Gates

Journal

IEEE ELECTRON DEVICE LETTERS

Vol

25 (3)

Page

153

Author

S. Zafar, B. H. Lee, and J. Stathis

Year

2004

Date

2004.03.03

doi

https://doi.org/10.1109/LED.2004.824244

File

2004_EDL_S.Zafar.pdf (146.0K) 0회 다운로드 DATE : 2021-04-01 15:45:42

Link

https://doi.org/10.1109/LED.2004.824244 144회 연결