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    • Subnanometer Scaling of HfO2/Metal Electrode Gate Stacks
    Journal
    Electrochemical and Solid-State Letters
    Vol
    7
    Page
    G164
    Author
    J.J. Peterson, C. D. Young, J. Barnett, S. Gopalan, J. Gutt, C.H. Lee, H.J. Li, T.HH. Hou, Y . Kim, C. Lim, N. Chaudhary, N. Moumen, B. H. Lee, G. Bersuker, G. Brown, P. Zeitzoff, M. Gardner, R. Murto, and H.Huff
    Year
    2004
    Date
    2004.06.14
    doi
    https://doi.org/10.1149/1.1760712
    File
    2004_ECS_J.J.Peterson.pdf (691.3K) 0회 다운로드 DATE : 2021-04-01 15:47:45