포항공대 EESL Fearless challenge

Charge Trapping and Detrapping Characteristics in Hafnium Silicate Gate Stack Under Static and Dynamic Stress

Journal

IEEE ELECTRON DEVICE LETTERS

Vol

26 (3)

Page

197

Author

R. Choi, S.J. Rhee, B. H. Lee, J. C. Lee, and G. Bersuker

Year

2005

Date

2005.02.28

doi

https://doi.org/10.1109/LED.2004.842639

File

2005_EDL_R.Choi.pdf (129.2K) 0회 다운로드 DATE : 2021-04-01 15:59:42

Link

https://doi.org/10.1109/LED.2004.842639 233회 연결