포항공대 EESL Fearless challenge

Nickel-silicide phase effects on flatband voltage shift and equivalent oxide thickness decrease of hafnium silicon oxynitride metal-silicon-oxide capacitors

Journal

APPLIED PHYSICS LETTERS

Vol

86

Page

222906

Author

C.Y. Kang, P. Lysaght, R. Choi, B. H. Lee, S.J. Rhee, C. H.Choi, M. S. Akbar, and J.C. Lee

Year

2005

Date

2005.05.26

doi

https://doi.org/10.1063/1.1942633

File

2005_APL_C.Y.Kang.pdf (692.6K) 0회 다운로드 DATE : 2021-04-01 16:19:04

Link

https://doi.org/10.1063/1.1942633 115회 연결