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Effects of Boron Diffusion in pMOSFETs With TiN-HfSiO Gate Stack

Journal

IEEE ELECTRON DEVICE LETTERS

Vol

26 (6)

Page

366

Author

S.C. Song, Z. Zhang, and B. H. Lee

Year

2005

Date

2005.05.23

doi

https://doi.org/10.1109/LED.2005.848071

File

2005_EDL_S.C.Song.pdf (368.9K) 0회 다운로드 DATE : 2021-04-01 16:23:09

Link

https://doi.org/10.1109/LED.2005.848071 180회 연결