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    • “Impact of Deposition Method of Metal Gate on Characteristics of Gate-First MOSFET with Hf-Silicate
    Journal
    Electrochemical and Solid-State Letters
    Vol
    8 (10)
    Page
    G261
    Author
    S.C.Song, B. H. Lee, Z.Zhang, S.H.Bae, K.Choi, P.Zeitzoff
    Year
    2005
    Date
    2005.08.04
    doi
    https://doi.org/10.1149/1.2007407
    File
    2005_ECS_S.C.Song.pdf (487.2K) 0회 다운로드 DATE : 2021-04-01 16:36:47