포항공대 EESL Fearless challenge

Integration of Dual Metal Gate CMOS on High-k Dielectrics Utilizing a Metal Wet Etch Process

Journal

Electrochemical and Solid-State Letters

Vol

8 (10)

Page

G271

Author

Z. Zhang, S.C. Song, C.Huffman, M. M. Hussain, J. Barnett, N.Moumen, H.N. Alshareef, P.Majhi, J.H. Sim, S.H. Bae, and B. H. Lee

Year

2005

Date

2005.08.12

doi

https://doi.org/10.1149/1.2030447

File

2005_ECS_Z.Zhang.pdf (424.9K) 0회 다운로드 DATE : 2021-04-01 16:38:10

Link

https://doi.org/10.1149/1.2030447 231회 연결