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    • Thermal response of Ru electrodes in contact with SiO2 and Hf based high-K gate dielectrics
    Journal
    JOURNAL OF APPLIED PHYSICS
    Vol
    98
    Page
    043520
    Author
    H.-C. Wen, P. Lysaght, M. Campin, B. Foran, G. Lian, Rusty Harris, H. Alshareef, K. Choi, H. Luan, C. Huffman, P. Majhi, B. H. Lee and D.L. Kwong
    Year
    2005
    Date
    2005.08.24
    doi
    https://doi.org/10.1063/1.2012510
    File
    2005_JAP_H.C.Wen.pdf (874.2K) 0회 다운로드 DATE : 2021-04-01 16:43:00