Charge trapping and detrapping characteristics in hafnium silicate gate dielectric using an inversion pulse measurement technique
- Journal
- APPLIED PHYSICS LETTERS
- Vol
- 87
- Page
- 122901
- Year
- 2005
- File
- 2005_APL_R.Choi.pdf (342.3K) 0회 다운로드 DATE : 2021-04-01 16:44:06
- Link
- https://doi.org/10.1063/1.2043252 171회 연결