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    • Improvement in bias instabilities of Hf-silicate by dilute hydrochloric acid(500:1) post deposition rinsing and its effect after high pressure H2 anneal
    Journal
    APPLIED PHYSICS LETTERS
    Vol
    87
    Page
    252903
    Author
    M.S. Akbar, N.Moumen, J.Barnett, B. H. Lee, and J.C.Lee
    Year
    2005
    Date
    2005.12.14
    doi
    https://doi.org/10.1063/1.2149974
    File
    2005_APL_MSAKBAR.pdf (334.9K) 1회 다운로드 DATE : 2021-04-01 16:50:11