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    • Comparison of multilayer dielectric thin films for future metal-insulator-metal capacitors: Al2O3/HfO2/Al2O3 versus SiO2/HfO2/SiO2
    Journal
    Jpn. J. of Appl. Phys.
    Vol
    50(10)
    Page
    Part 2
    Author
    S.U.Park, H.M,Kwon, I.S. Han, Y.J. Jung, H.Y.Kwak, W.I. Choi, M.L. Ha, J.I. Lee, C.Y. Kang, B.H. Lee, R. Jammy, H.D. Lee
    Year
    2011
    Date
    2011.10.20
    doi
    http://dx.doi.org/10.1143/JJAP.50.10PB06
    File
    2011_JJAP_SUPARK.pdf (572.5K) 0회 다운로드 DATE : 2021-03-30 21:02:25