포항공대 EESL Fearless challenge

The variation of the enhanced PL efficiency of Y 2 O 3 :Eu 3+ phosphor films with the height to the ZrO 2 nanoparticle-assisted 2D PCL by reverse nano-imprint lithography

Journal

Microelectronic Engineering

Vol

136

Page

48-50

Author

C.K.Park, H.J.Kim, K.Y.Ko, K.K.Kim, B.H.Lee, J.H.Ahn

Year

2015

Date

2015.03.25

doi

https://doi.org/10.1016/j.mee.2015.03.035

File

2015-ME-CKPark.pdf (898.1K) 0회 다운로드 DATE : 2021-04-01 21:00:24

Link

https://doi.org/10.1016/j.mee.2015.03.035 181회 연결