Morphology and Crystallization of Ultra Thin HfON (EOT≤1nm) with TiN Metal Gate: Impact on Electron Mobility
Journal
Electrochem. Solid-State Lett.
Vol
9
Page
G77
Author
S.C. Song, J. Sim, Z. Zhang, S. Bae, P. Kirsch, G. Bersuker, and B. H. Lee
Year
2006
Date
2006.01.09
doi
https://doi.org/10.1149/1.2161441
File
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