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    • Contact resistance improvement by the modulation of peripheral length to area ratio of graphene contact pattern
    Journal
    Applied Physics Letters
    Vol
    106 (21)
    Page
    213107
    Author
    C.Cho, S.K.Lee, J.Noh, W.Park S.C.Lee, Y.G.Lee, H.J.Hwang, M.Ham, B.H.Lee
    Year
    2015
    Date
    2015.05.25
    doi
    https://doi.org/10.1063/1.4921797
    File
    2015-APL-CCho.pdf (1.0M) 1회 다운로드 DATE : 2021-04-01 21:07:12