포항공대 EESL Fearless challenge

Analysis of trap effect on reliability using the charge pumping technology in La-incorporated high-k dielectrics

Journal

Microelectronics Engineering

Vol

88

Page

3415-3418

Author

H.M. Kwon, W.H. Choi, I.S. Han, S.U. Park, B.S. Park, Y.Y. Zhang, C.Y. Kang, B.H.Lee, R. Jammy, H.D.Lee

Year

2011

Date

2011.12

doi

https://doi.org/10.1016/j.mee.2010.06.007

File

2011-ME-HMKWON-2.pdf (549.8K) 0회 다운로드 DATE : 2021-03-30 21:09:48

Link

https://doi.org/10.1016/j.mee.2010.06.007 185회 연결