Evaluation of titanium silicon nitride as gate electrodes for complimentary metal-oxide semicondiuctor
Journal
Appl. Phys. Lett.
Vol
88(14)
Page
142113
Author
H. Luan, H. N. Alshareef, H. R. Harris, H. C. Wen, K. Choi, Y. Senzaki, P. Majhi and B. H. Lee
Year
2006
Date
2006.04.07
doi
https://doi.org/10.1063/1.2188380
File
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