포항공대 EESL Fearless challenge

Highly Manufacturable Advanced Gate Stack Technology for Sub 45nm Self-Aligned Gate-First CMOSFETs

Journal

IEEE Trans. on Elec. Dev.

Vol

53(5)

Page

979-989

Author

S. C. Song, Z. Zhang, C. Huffman, J. H. Sim, S. H. Bae, P. Kirsch, P. Majhi, N. Moumen, and B. H. Lee

Year

2006

Date

2006.04.24

doi

10.1109/TED.2006.872700

File

2006_TED_SCSONG.pdf (793.0K) 0회 다운로드 DATE : 2021-04-01 21:45:24

Link

http://10.1109/TED.2006.872700 87회 연결