Electron Trap Generation in High-k Gate Stacks by Constant Voltage Stress
Journal
IEEE Trans. Dev. Mat. Reliability
Vol
6(2)
Page
123-131
Author
C.D. Young, D. Heh, S. Nadkarni, R. Choi, J.J. Peterson, J. Barnett, B. H. Lee, and G. Bersuker
Year
2006
Date
2006.08.14
doi
10.1109/TDMR.2006.877865
File
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