Negative oxygen vacancies in HfO2 as charge traps in high-k stacks
Journal
Appl. Phys. Lett.
Vol
89(8)
Page
082908
Author
J.L.Gavartin, D.Munz Ramo, A.L.Shluger, G.Bersuker, B. H. Lee
Year
2006
Date
2006.08.24
doi
https://doi.org/10.1063/1.2236466
File
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