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    • Mobility and Charge Trapping Comparison for Crystalline and Amorphous HfON and HfSiON Gate Dielectrics
    Journal
    Appl. Phys. Lett.
    Vol
    89(24)
    Page
    242909
    Author
    P.Kirsch, M.A.Quevedo-Lopez, S.A.Krishnan, G.Pant, M.J.Kim, R.M.Wallace, B.E.Gande, and B. H. Lee
    Year
    2006
    Date
    2006.12.13
    doi
    https://doi.org/10.1063/1.2392992
    File
    2006_APL_P.D.Kirsch.pdf (410.1K) 0회 다운로드 DATE : 2021-04-02 13:47:57