포항공대 EESL Fearless challenge

Improvement of metal gate/high-k dielectric CMOSFETs characteristics by neutral beam etching of metal gate

Journal

Solid State Electronics

Vol

86

Page

p.75-78

Author

K.S. Min, C. Park,C.Y. Kang, C.S. Park, B.J. Park, Y.W. Kim, B.H. Lee, Jack C. Lee, G. Bersuker, P. Kirsch, R. Jammy, G.Y. Yeom

Year

2013

Date

2013.08

doi

https://doi.org/10.1016/j.sse.2012.07.023

File

2012-SSE-KSMIN.pdf (576.1K) 1회 다운로드 DATE : 2021-03-30 21:57:18

Link

https://doi.org/10.1016/j.sse.2012.07.023 220회 연결