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    • Performance and reliability improvement of HfSiON gate dielectrics using chlorine plasma treatment
    Journal
    Applied Physics Letters
    Vol
    94 (4)
    Page
    042911
    Author
    H.B. Park, B.S. Ju, C.Y. Kang, C. Park, C.S. Park, B.H. Lee, T.W. Kim, B.S. Kim, R. Choi
    Year
    2009
    Date
    2009.01.30
    doi
    https://doi.org/10.1063/1.3078277
    File
    2009_APL_HBPARK.pdf (233.4K) 1회 다운로드 DATE : 2021-04-02 16:51:16