포항공대 EESL Fearless challenge

“Smart” TDDB algorithm for investigating degradation in high-κ gate dielectric stacks under constant voltage stress

Journal

Microelectronic Engineering

Vol

86 (3)

Page

287-290

Author

C.D. Young, G. Bersuker, J. Tun, R.Choi, D. Heh, B.H. Lee

Year

2009

Date

2009.03

doi

http://doi.org/10.1016/j.mee.2008.09.024

File

2009_ME_CDYOUNG.pdf (458.9K) 0회 다운로드 DATE : 2021-04-02 17:12:13

Link

http://doi.org/10.1016/j.mee.2008.09.024 172회 연결