포항공대 EESL Fearless challenge

Comparison of La-based high-k dielectrics: HfLaSiON and HfLaON

Journal

Microelectronic Engineering

Vol

86 (3)

Page

268-271

Author

W.H. Choi, I.S. Han, H.M. Kwon, T.G. Goo, M.K. Na, O.S. Yoo, G.W. Lee, C.Y. Kang, R. Choi, S.C. Song, B.H. Lee, R. Jammy, Y.H. Jeong, H.-D. Lee

Year

2009

Date

2009.03

doi

http://doi.org/10.1016/j.mee.2008.04.008

File

1-s2.0-S0167931708001706-main.pdf (211.7K) 0회 다운로드 DATE : 2021-04-02 17:07:56

Link

http://doi.org/10.1016/j.mee.2008.04.008 161회 연결