포항공대 EESL Fearless challenge

Wafer-Scale Integration of Highly Uniform and Scalable MoS2 Transistors

Journal

ACS Applied Materials & Interfaces

Vol

9 (42)

Page

37146-37153

Author

Y.H. Kim, A.R. Kim, G. Zhao, S.Y. Choi, S.C. Kang, S.K. Lim, K.E. Lee, J.C. Park, B.H. Lee, M.G. Hahm, D.H. Kim, J.J. Yun, K.H. Lee, B.J. Cho

Year

2017

Date

2017.10.25

doi

http://doi.org/10.1021/acsami.7b10676

File

2017-acsami.7b10676 1.pdf (5.4M) 0회 다운로드 DATE : 2021-04-02 18:05:36

Link

http://doi.org/10.1021/acsami.7b10676 191회 연결