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Intrinsic time zero dielectric breakdown characteristics of HfAlO Alloys

Journal

IEEE Trans. Electron Device

Vol

60(11)

Page

p.3683

Author

J.J. Kim, M.W.Kim, U.J. Jung, K.E.Chang, S.K.Lee, Y.H.Kim, Y.G. Lee, R.Choi, B.H.Lee*

Year

2013

Date

2013.09.30

doi

https://doi.org/10.1109/TED.2013.2281857

File

2013_TED_JJKIM.pdf (2.2M) 1회 다운로드 DATE : 2021-03-30 22:23:49

Link

https://doi.org/10.1109/TED.2013.2281857 186회 연결