Theoretical study of the insulator/insulator interface: Band alignment at the SiO2/HfO2 junction
- Journal
- Phys. Rev. B
- Vol
- 75
- Page
- 035306
- Year
- 2007
- File
- 2007_PRB_OSHARIA.pdf (962.1K) 0회 다운로드 DATE : 2021-04-01 12:53:51
- Link
- https://doi.org/10.1103/PhysRevB.75.035306 225회 연결