Effects of Gate Edge Profile On Off-state Leakage Suppression in Metal Gate/High-k Dielectric Metal-Oxide-Semiconductor Field Effect Transistors
- Journal
- Appl. Phys. Lett.
- Vol
- 90
- Page
- 183501
- Year
- 2007
- File
- 2007_APL_CYKANG.pdf (783.9K) 0회 다운로드 DATE : 2021-04-01 13:26:28
- Link
- http://doi.org/10.1063/1.2734381 139회 연결