Effects of Gate Edge Profile On Off-state Leakage Suppression in Metal Gate/High-k Dielectric Metal-Oxide-Semiconductor Field Effect Transistors
Journal
Appl. Phys. Lett.
Vol
90
Page
183501
Author
C.Y. Kang, R. Choi, S.C. Song and B. H. Lee
Year
2007
Date
2007.04.30
doi
http://doi.org/10.1063/1.2734381
File
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