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Stabilization of Higher-k Tetragonal HfO2 by SiO2 Admixture Enabling Thermally Stable Metal Insulator Metal Capacitors

Journal

Appl. Phys. Lett.

Vol

91

Page

072902

Author

T. Boscke, S. Govindarajan , P.D. Kirsch , P.Y. Hung , C. Krug , B. H. Lee, J. Heitmann , U. Schroeder , G. Pant , B.E. Gnade , W.H. Krautschneider

Year

2007

Date

2007.08.14

doi

http://doi.org/10.1063/1.2771376

File

2007_APL_TBOSCKE.pdf (530.5K) 1회 다운로드 DATE : 2021-04-01 13:51:20

Link

http://doi.org/10.1063/1.2771376 131회 연결