포항공대 EESL Fearless challenge

Metal Electrode/High-k Dielectric Gate Stack Technology for Power Management

Journal

IEEE Transactions on Electron Devices

Vol

55 (1)

Page

p.8-20

Author

B.H.Lee, S.C.Song, R.Choi and P.Kirsch

Year

2008

Date

2007.12.26 (invited)

doi

http://doi.org/10.1109/TED.2007.911044

File

2008_TOED_BHLEE.pdf (607.3K) 0회 다운로드 DATE : 2021-04-01 14:52:49

Link

http://doi.org/10.1109/TED.2007.911044 83회 연결