Contact Resistance Reduction for MoS2 FETs with Insulating Layers
Conference
44th IEEE Semiconductor Interface Specilaists Conference (SISC)
Author
W.J.Park, Y.H.Kim, S.K.Lee, U.Jung, J.H.Yang, C.Cho, Y.J.Kim, S.K.Lim, and B.H.Lee
Year
2014
Date
2014
학회구분
International
File
2014_SISC_WJPARK.pdf (279.9K) 0회 다운로드 DATE : 2021-04-02 15:08:50