Contact Resistance Reduction using Fermi Level De-pinning Layer for MoS2 FETs
Conference
Tech. Dig of IEDM
Author
W.J.Park, Y.H.Kim, S.K.Lee, U.Jung, J.H.Yang, C.Cho, Y.J.Kim, S.K.Lim, I.S. Hwang, H.B.R.Lee, and B.H.Lee
Year
2014
Date
2014
학회구분
International
File
2014_IEDM_WPARK.pdf (948.9K) 5회 다운로드 DATE : 2021-04-02 15:09:32