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2002
1
Y.J. Cho, N.V.Nguyen, C.A.Richter, J.R.Ehrstein, B. H. Lee, and Jack C.Lee,
"Spectroscopic ellipsometry characterization of high-k dielectric HfO2 thin films and the high-temperature annealing effects on their optical properties"
Applied Physics Letters
,
80,
1249,
2002.02.14.
https://doi.org/10.1063/1.1448384.
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