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    • Effects of In Situ O2 Plasma Treatment on OFF-State Leakage and Reliability in Metal-Gate/High-k Dielectric MOSFETs
    Journal
    IEEE Electron Device Letters
    Vol
    29 (6)
    Page
    p.565-567
    Author
    K.T.Lee, C.Y. Kang, B.S. Ju, R. Choi, K.S.Min, O.S.Yoo, B.H.Lee, R. Jammy, J.C.Lee, H.D. Lee, Y.H. Jeong
    Year
    2008
    Date
    2008.05.20
    doi
    http://doi.org/10.1109/LED.2008.922992
    File
    2008_EDL_KTLEE1.pdf (408.6K) 0회 다운로드 DATE : 2021-04-01 14:55:34