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    • Probing stress effects in HfO2 gate stacks with time dependent measurements
    Journal
    Microelectronics and Reliability
    Vol
    45
    Page
    806-810
    Author
    C. D. Young, G. Bersuker, Y. Zhao, J. J. Peterson, J. Barnett, G. A. Brown, J. H. Sim, R. Choi, B. H. Lee and P. M. Zeitzoff
    Year
    2005
    Date
    2004.12.23
    doi
    https://doi.org/10.1016/j.microrel.2004.11.043
    File
    2005_MR_C.D.Young.pdf (365.8K) 0회 다운로드 DATE : 2021-04-01 16:16:42