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    • Hot Carrier Degradation of HfSiON Gate Dielectrics with TiN Electrode
    Journal
    IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY
    Vol
    5 (2)
    Page
    177
    Author
    J.H. Sim, B. H. Lee R. Choi, S.-C.Song, and G. Bersuker
    Year
    2005
    Date
    2005.06.27
    doi
    https://doi.org/10.1109/TDMR.2005.851211
    File
    2005_TDMR_JHSIM.pdf (558.7K) 0회 다운로드 DATE : 2021-04-01 16:21:32