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    • Integration of Dual Metal Gate CMOS on High-k Dielectrics Utilizing a Metal Wet Etch Process
    Journal
    Electrochemical and Solid-State Letters
    Vol
    8 (10)
    Page
    G271
    Author
    Z. Zhang, S.C. Song, C.Huffman, M. M. Hussain, J. Barnett, N.Moumen, H.N. Alshareef, P.Majhi, J.H. Sim, S.H. Bae, and B. H. Lee
    Year
    2005
    Date
    2005.08.12
    doi
    https://doi.org/10.1149/1.2030447
    File
    2005_ECS_Z.Zhang.pdf (424.9K) 0회 다운로드 DATE : 2021-04-01 16:38:10