Thermal response of Ru electrodes in contact with SiO2 and Hf based high-K gate dielectrics
- Journal
- JOURNAL OF APPLIED PHYSICS
- Vol
- 98
- Page
- 043520
- Year
- 2005
- File
- 2005_JAP_H.C.Wen.pdf (874.2K) 0회 다운로드 DATE : 2021-04-01 16:43:00
- Link
- https://doi.org/10.1063/1.2012510 243회 연결