Improvement in bias instabilities of Hf-silicate by dilute hydrochloric acid(500:1) post deposition rinsing and its effect after high pressure H2 anneal
- Journal
- APPLIED PHYSICS LETTERS
- Vol
- 87
- Page
- 252903
- Year
- 2005
- File
- 2005_APL_MSAKBAR.pdf (334.9K) 1회 다운로드 DATE : 2021-04-01 16:50:11
- Link
- https://doi.org/10.1063/1.2149974 189회 연결