Improvement in bias instabilities of Hf-silicate by dilute hydrochloric acid(500:1) post deposition rinsing and its effect after high pressure H2 anneal
Journal
APPLIED PHYSICS LETTERS
Vol
87
Page
252903
Author
M.S. Akbar, N.Moumen, J.Barnett, B. H. Lee, and J.C.Lee
Year
2005
Date
2005.12.14
doi
https://doi.org/10.1063/1.2149974
File
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