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    • Performance of HfO2 Gate Stacks with in-situ Grown and O3 Chemical Interfacial Oxide Layers
    Journal
    APPLIED PHYSICS LETTERS
    Vol
    87
    Page
    253510
    Author
    C.S. Park, N. Moumen, J. H. Sim, J. Barnnet, B. H. Lee, and G. Bersuker
    Year
    2005
    Date
    2005.12.15
    doi
    https://doi.org/10.1063/1.2149511
    File
    2005_APL_CSPARK.pdf (909.3K) 0회 다운로드 DATE : 2021-04-01 16:51:26