A study of the leakage current in TiN/HfO2/TiN capacitors
Journal
Microelectronic Engineering
Vol
95
Page
71-73
Author
S. Cimino, A. Padovani, L. Larcher, V.V. Afanas’ev, H.J. Hwang, Y.G. Lee, M. Jurczac, D. Wouters, B.H. Lee, H. Hwang, L. Pantisano
Year
2012
Date
2012.07
doi
http://doi.org/10.1016/j.mee.2011.03.009
File
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