포항공대 EESL Fearless challenge

New Insight Into PBTI Evaluation Method for nMOSFETs With Stacked High-k/IL Gate Dielectric

Journal

IEEE Electron Device Letters

Vol

33 (11)

Page

1517-1519

Author

S.K. Lee, M.S.Jo, C.W. Sohn, C.Y. Kang, J.C. Lee, Y.H. Jeong, B.H. Lee

Year

2012

Date

2012.11

doi

http://doi.org/10.1109/LED.2012.2211072

File

2012-EDL-SKLEE.pdf (645.3K) 0회 다운로드 DATE : 2021-04-02 17:45:15

Link

http://doi.org/10.1109/LED.2012.2211072 234회 연결