포항공대 EESL Fearless challenge

Layer-by-Layer Growth of Two-dimensional Tellurium Thin Films via Ultra-High Pressure Atomic Layer Deposition for p-Type Semiconductor

Journal

In press, Nano Letters

Author

D.C.C. Tran, G.H. Pham, T.T.H. Chu, J. Kim, J.K. Jeong, S.I. Im, B.H. Lee and M.M. Sung

Year

2024

Date

2024