포항공대 EESL Fearless challenge

Sub-10-nm Graphene Nanoribbon Array Field-Effect Transistors Fabricated by Block Copolymer Lithography

Journal

Advanced Materials

Vol

25

Page

pp.4723-4728

Author

M. Son, J.G. Son,K.-J. Moon, B.H. Lee, J.-M. Myoung, M. S. Strano, M.-H. Ham*, and C.A. Ross

Year

2013

Date

2013.06.25

doi

https://doi.org/10.1002/adma.201300813

File

2013_AM_MHHam.pdf (4.1M) 1회 다운로드 DATE : 2021-03-30 22:17:21

Link

https://doi.org/10.1002/adma.201300813 171회 연결